Mask carrier treatment to prevent haze and ESD damage

ABSTRACT

A reticle carrier including a base portion and a cover portion at least partially detachable from the base portion. The base portion and the cover portion are configured to collectively house a reticle in a region collectively defined by the base portion and the cover portion when the base portion and the cover portion are fully attached. At least a portion of an interior surface of at least one of the base portion and the cover portion is treated with a sulfide-absorbing composition, such as silver or a silver-containing alloy.

This application is related to commonly-assigned U.S. application Ser.No. 11/236,169, entitled “FULLY ELECTRIC FIELD SHIELDING RETICLE POD,”filed Sep. 27, 2005.

BACKGROUND

When not in use, reticles and other masks are housed in reticle podsand/or similar reticle carriers. The carriers are often made ofdissipative material to reduce the risk of electrostatic discharge (ESD)inadvertently damaging the reticle when the reticle is being transferredto or from the carrier. Generally, the reticle is housed in a carrieruntil its utilization during lithographic processing, such as in ascanner or stepper. Thereafter, the reticle is returned to the samecarrier or another carrier until its next use.

When the reticle is employed during lithography processing, the exposurelight utilized for pattern transfer can enhance sulfide and ammonia inthe environment. The subsequent reaction can result in the formation ofa haze on the reticle, whether on the glass side and/or patterned(chromium) side. Moreover, previous attempts to prevent the formation ofsuch haze generally result in increased risk of ESD damage.

BRIEF DESCRIPTION OF THE DRAWINGS

The present disclosure is best understood from the following detaileddescription when read with the accompanying figures. It is emphasizedthat, in accordance with the standard practice in the industry, variousfeatures are not drawn to scale. In fact, the dimensions of the variousfeatures may be arbitrarily increased or reduced for clarity ofdiscussion.

FIG. 1 is a sectional view of at least a portion of an embodiment ofapparatus according to aspects of the present disclosure.

FIG. 2 is a sectional view of the apparatus shown in FIG. 1 in asubsequent stage of manufacture according to aspects of the presentdisclosure.

FIG. 3 is a perspective view of at least a portion of an embodiment ofthe apparatus shown in FIG. 1.

FIG. 4 is a perspective view of a portion of the apparatus shown in FIG.3.

FIG. 5 is a magnified view of a portion of the apparatus shown in FIG.4.

FIG. 6 is a perspective view of a portion of the apparatus shown in FIG.3.

FIG. 7 is a magnified view of a portion of the apparatus shown in FIG.6.

FIG. 8 is a top view of at least a portion of an embodiment of apparatusaccording to aspects of the present disclosure, the apparatus beingdepicted in a closed configuration.

FIG. 9 is a front view of the apparatus shown in FIG. 8, the apparatusbeing depicted in the closed configuration of FIG. 8.

FIG. 10 is a top view of the apparatus shown in FIG. 9, the apparatusbeing depicted in an open configuration.

DETAILED DESCRIPTION

It is to be understood that the following disclosure provides manydifferent embodiments, or examples, for implementing different featuresof various embodiments. Specific examples of components and arrangementsare described below to simplify the present disclosure. These are, ofcourse, merely examples and are not intended to be limiting. Inaddition, the present disclosure may repeat reference numerals and/orletters in the various examples. This repetition is for the purpose ofsimplicity and clarity and does not in itself dictate a relationshipbetween the various embodiments and/or configurations discussed.Moreover, the formation of a first feature over or on a second featurein the description that follows may include embodiments in which thefirst and second features are formed in direct contact, and may alsoinclude embodiments in which additional features may be formedinterposing the first and second features, such that the first andsecond features may not be in direct contact.

Referring to FIG. 1, illustrated is a sectional view of at least aportion of an embodiment of apparatus 100 according to aspects of thepresent disclosure. The apparatus 100 may be or include a container orcarrier (hereafter collectively referred to as a container) configuredto house at least one reticle 110. However, the scope of the presentdisclosure is not limited to such implementations. For example, aspectsof the present disclosure may be applicable or readily adaptable tocontainers utilized to house other ESD-sensitive object(s), whether forstorage and/or transportation. Such ESD-sensitive objects may include,without limitation, photomasks and other masks. The container apparatus100 may also be referred to as reticle box, reticle pod or reticlecarrier. The container 100 may be configured to contain a single reticle100 or multiple reticles, including multiple different reticles.

The container 100 may include a base portion 102 and a cover portion104. The base portion 102 and cover portion 104 are configured tosubstantially envelope the one or more reticles 110 being stored and/ortransported via the container 100. For example, as in the embodimentdepicted in FIG. 1, the base portion 102 and the cover portion 104 maybe configured to cooperate to form a six-sided box. However, the baseportion 102 may not necessarily exhibit the substantially planar shapedepicted in FIG. 1, yet may still be configured to cooperate with thecover portion 104 to form a box or otherwise-shaped enclosure.

The base portion 102 and/or the cover portion 104 may partially orsubstantially comprise a dissipative material (e.g., electrostaticdissipative material). The dissipative material may include cellophane,glassine and/or other materials, including those having a surfaceresistivity ranging between about 10⁵ ohms/in² and about 10¹² ohms/in².Alternatively, or additionally, the base portion 102 and cover portion104 may partially or substantially comprise a plastic material and/orother dielectric materials. For example, the base portion 102 and coverportion 104 may include a multilayer structure including a layer ofplastic film and a layer of electrostatic-dissipative material film,which may be adhered or otherwise coupled to one another.

The cover portion 104 may be configured to include one or more doorslocated in one or more of its side walls operable to provide one or moreopenings through which one or more reticles 110 may be transferred intoand out of the container 100. Alternatively, or additionally, such doormay be located on the base portion 102 and/or a portion of the coverportion 104 distally opposing and, possibly, substantially parallel tothe base portion 102. The cover portion 104 may also include a handleextending from or coupled to one or more of the outer surfaces of thecover portion 104 and/or the base portion 102. For example, such handlemay be configured to aid human or automatic handling of the containerapparatus 100.

The reticle 110 includes a substantially transparent substrate 112having an opaque pattern 114 formed thereon. The substrate 112 maypartially or substantially comprise fused quartz (e.g., SiO₂) and/orcalcium fluoride (e.g., CaF₂), and/or other materials or combinationsthereof. The reticle 110 also includes a patterned absorption layer 114formed on the substrate 112, such as may include chromium, iron oxide,or an inorganic film made with MoSi, ZrSiO, SiN, and/or TiN, among othermaterials. The reticle 110 may also include a plurality ofphase-shifting features, such as may be etched into or deposited ontothe substrate 112, or such as may be integral to the absorption layer114 for phase shifting of a radiation beam incident thereon. Thepatterned layer 114 may partially or substantially comprise MoSi, whichmay also function as a phase shifter. The shifter may also beincorporated into a phase-shift mask (PSM).

The reticle 110 may also include a pellicle 116, which may be supportedat a distance from the substrate 112 by a standoff or pellicle frame118. The pellicle 116 may be offset from the substrate 112 by an amountsuch that any particulates or contaminants may settle on the pellicle116 instead of on the substrate 112. For example, if such contaminantsare allowed to settle on the substrate 112, the pattern transferred fromthe reticle 110 to a working piece (e.g., a silicon process wafer) maybe inaccurate. However, by employing the pellicle 116 at an offsetdistance from the substrate 112, the contaminants may instead settle onthe pellicle 116, which may be out of the focal plane of the exposureapparatus employed to transfer the pattern of the absorption layer 114.Consequently, the contaminants may have less or no effect on theaccuracy of the pattern transferred to the working piece.

The pellicle 116 may comprise a thin layer (e.g., relative to thethickness of the substrate 112) that is stretched or otherwise formedover the frame 118 above the surface of the substrate 112. The pellicle116 may be substantially transparent, at least optically, relative tothe exposure apparatus employed during pattern transfer.

The container 100 may also include one or more support members 106configured to individually or collectively support one or more reticles110 inside the container 100. The support members 106 may be formedintegrally with the base portion 102 and/or the cover portion 104.Alternatively, the support members 106 may be discrete members that arecoupled to the base portion 102 and/or the cover portion 104 byadhesive, welding, threaded or other mechanical fasteners, and/or othercoupling means.

The container apparatus 100, the reticle 110, and/or portions thereofmay be commercially available apparatus. For example, the containerapparatus 100 may be (or be substantially similar to) a reticle podcommercially available from Microtome Precision, Inc., of ColoradoSprings, Colo. Examples of such Microtome reticle pods include the E111SEMI SPRA 99101-00 (a SEMI-compliant, 150 mm, single reticle pod forautomated operations) and the E111 SEMI SPRA 99101-00 (a SEMI-compliant,150 mm, single reticle pod for manual operations). Additional examplesof Microtome reticle pods include the E112 SEMI MRC 99600-00 (aSEMI-compliant, 6 inch, multi-reticle cassette), the 6 inchmulti-reticle cassette 87620-00 (for use on ASML equipment), the E112SEMI MRPA 21321-00 (a SEMI-compliant, 150 mm, multi-reticle pod forautomated operations), and the E112 SEMI MRPM 21320-00 (aSEMI-compliant, 150 mm, multi-reticle pod for manual operations).

The reticle 110 may substantially conform to industry standard SEMI P1or SEMI P34, and the pellicle 118 may substantially conform to industrystandard SEMI P5. The lateral dimensions of the reticle 110 (with orwithout the pellicle 118) may range between about 5 inches and about 6inches, with a thickness of about 3/32-inch, ⅛-inch or ¼-inch. Theoverall lateral dimensions of the apparatus 100 may range between about4 inches and about 9 inches, with an overall thickness ranging betweenabout one-half inch and about 2 inches. Of course, the scope of thepresent disclosure is not limited to such dimensions.

Referring to FIG. 2, illustrated is a sectional view of the containerapparatus 100 shown in FIG. 1 in a subsequent manufacturing stageaccording to aspects of the present disclosure. One or more surfaces ofone or more of the above-described components of the container 100 mayinclude an absorbing layer 120. The absorbing layer 120 may be formed onone or more external surfaces 104 a of the cover portion 104, one ormore internal surfaces 104 b of the cover portion 104, one or moreexternal surfaces 102 a of the base portion 102, and/or one or moreinternal surfaces 102 b of the base portion 102. The absorbing layer 120may additionally or alternatively be formed on one or more surfaces ofthe reticle substrate 112 and/or one or more surfaces of the reticlepellicle 116. While the embodiment shown in FIG. 2 includes an absorbinglayer 120 on each of these surfaces, other embodiments may not includesuch extensive coverage of absorbing layers 120. For example, thereticle substrate 112 and/or pellicle 116 may include absorbing layers120 even if the base portion 102 and/or cover portion 104 do not, andthe base portion 102 and/or cover portion 104 may include absorbinglayers 120 even if the reticle substrate 112 and/or pellicle 116 do not.

Each absorbing layer 120 may partially or substantially comprise silver(Ag). A characteristic of silver is its ability to absorb sulfide.Consequently, sulfide may be partially or substantially absorbed by theabsorbing layer(s) 120, thus reducing or eliminating the sulfide-ammoniareaction that conventionally forms a haze on the reticle substrate 112and/or pellicle 116. However, other materials may also or additionallybe employed in one or more of the absorbing layers 120. One or more ofthe absorbing layers 120 may also or alternatively include stainlesssteel, copper, aluminum, iron, nickel, or combinations thereof.

One or more of the absorbing layers 120 may have a thickness rangingbetween about 0.6 mm and about 1.0 mm, although other thicknesses arealso within the scope of the present disclosure. The absorbing layer(s)120 may be formed by electroplating, electroless plating, spin-oncoating, chemical vapor deposition (CVD), physical vapor deposition(PVD) such as evaporation and sputtering, or a combination thereof. Theabsorbing layer(s) 120 may also be formed by implant or dopingprocedures. The container apparatus 100 may also include one or moreadhesive layers to enhance the adhesion of one or more of the absorbinglayers 120 to underlying surfaces. Each absorbing layer 120 may also besubstantially similar in composition and/or manufacture, although otherembodiments may include different absorbing layers 120 that vary incomposition and/or manufacture.

Aspects of the present disclosure may allow the elimination of the hazewhich conventionally formed on the reticle substrate 112, pellicle 116and/or portions of the container apparatus 100 due to the reaction ofsulfide and ammonia. Alternatively, such aspects may substantiallydecrease the rate at which the haze conventionally forms. In eithercase, the lifetime (e.g., exposure cycles and/or storage duration) ofthe reticle 110 and/or pellicle 116 may be substantially increased.

Moreover, such results can be achieved even with the base portion 102and/or the cover portion 104 being substantially metallic, including ina manner that substantially prevents or reduces electric fields passingthrough the base and/or cover portions 102, 104, isolating charge itemsin the environment. Thus, one embodiment within the scope of the presentdisclosure can include modifying a commercially available reticle pod,cassette, carrier, etc. by forming the above-described absorbinglayer(s) 120 on one or more surfaces. Alternatively, such formation ofthe absorbing layer(s) 120 may be performed by the manufacturer of thereticle pod, cassette or carrier, whether such formation includesdeposition and/or doping processing. However, the elimination orreduction of haze on the reticle substrate 112 and/or pellicle 116resulting from the reaction of sulfide and ammonia can also oralternatively be achieved by covering or implanting at least a portionof the reticle substrate 112 and/or pellicle 116 with theabove-described absorbing layer(s) 120.

In either case, the number of reticles and/or pellicles which areconventionally scrapped due to haze formation or ESD damage can besubstantially reduced with the implementation of one or more aspects ofthe present disclosure. Moreover, as a result of reduced, delayed oreliminated haze formation, wafer yield can also be improved with theimplementation of one or more aspects of the present disclosure.

Additionally, aspects of the above-described absorbing layer(s) 120 maybe applicable or readily adaptable to a reticle operation environment,in contrast to the reticle storage and transportation environment of thecontainer apparatus 100. For example, by coating, implanting orotherwise treating surfaces of the reticle operation environment (e.g.,within a lithographic pattern transfer apparatus) with silver and/orother absorbing materials, haze formation on the reticle may also bereduced, delayed or eliminated during and after reticle operations.

Aspects of the present disclosure are also applicable or readily adaptedto non-conventional reticle carrier apparatus. For example, in contrastto coating the surfaces of a conventional reticle carrier apparatus witha sulfide- or ammonia-absorbing composition, the structure of a reticlecarrier apparatus can substantially comprise a sulfide- orammonia-absorbing composition. Thus, in one embodiment, the base andcover portions 102, 104 shown in FIGS. 1 and 2 may substantiallycomprise silver, for example. Moreover, such structure may also be dopedor implanted with one or more dissipative materials, in contrast toembodiments described above in which the base and cover portions 102,104 substantially comprise one or more dissipative materials that aredoped or implanted with one or more sulfide- or ammonia-absorbingmaterials.

In a related embodiment, a liner, sheet, plate or other component may becoupled inside the apparatus 100, and may partially or substantiallycomprise silver and/or another absorbing composition, and/or may becoated with silver and/or another absorbing composition. Thus, incontrast to coating or implanting an absorbing composition into anexisting apparatus (e.g., a commercially available reticle container),or in addition to such processing, the additional component may becoupled inside the apparatus 100, whether by adhesive, welding, threadedor other mechanical fasteners, and/or otherwise.

Referring to FIG. 3, illustrated is a perspective view of at least aportion an embodiment of the apparatus 100 shown in FIGS. 1 and 2,herein designated by the reference numeral 150. The container apparatus150 is substantially similar to the container apparatus 100 shown inFIGS. 1 and 2, with the possible exceptions/additions described below.

The apparatus 150 includes a base portion 152 and a cover portion 154which may be substantially similar in composition and manufacture to thebase portion 102 and cover portion 104 shown in FIGS. 1 and 2, but mayhave a different shape compared to the base and cover portions 102, 104.When assembled, the base portion 152 may be substantially enclosed bythe cover portion 154. For example, only tabs 153 of the base portion152 are visible in FIG. 3. The tabs 153 may be function in the alignmentand/or engagement of the base and cover portions 152, 154.

The apparatus 150 also includes a handle 160 secured to or extendingfrom the cover portion 154. The handle 160 may be configured for manualand/or automated operations involving the apparatus 150. The apparatus150 may also include an exterior platform 162 secured to or extendingfrom the cover portion 154. The platform 162 may aid in stackingmultiple instances of the apparatus 150, particular where the handle 160is externally positioned in a central portion of the cover portion 154,such as in the embodiment depicted in FIG. 3. For example, the height towhich the platform 162 extends from the cover portion 154 may be aboutequal to or greater than the height to which the handle extends from thecover portion 154 (or other mutual reference point). Consequently, theplatform 162 may provide a substantially flat or planar surface uponwhich an additional instance of the apparatus 150 may be stacked withgreater stability, at least compared to the stability of such stackingin the absence of the platform 162.

The platform 162 may include a perimeter and/or inner profile (whethertwo-dimensional or three-dimensional) that substantially conforms orotherwise cooperates with a corresponding profile of the base portion152. Consequently, engagement or other cooperation of the correspondingperimeters and/or profiles of the platform 162 of a first instance ofthe apparatus 150 and the base portion 152 of a second instance of theapparatus 150 may limit the relative lateral translation of the firstand second instances of the apparatus 150 when stacked one upon theother. Thus, for example, the height of the platform 162 relative to thehandle 160 may provide roll, pitch and/or vertical stability whenmultiple instances of the apparatus 150 are stacked, and thecorresponding perimeters and/or profiles of the platform 162 and thebase portion 152 may simultaneously provide lateral and/or yawstability.

The exterior surfaces 154 a of the cover portion 154, the handle 160and/or the platform 162 may be partially or substantially treated withone or more absorbing layers 170. Each absorbing layer 170 may besubstantially similar in composition and manufacture to the absorbinglayer 120 described above. For example, the absorbing layer(s) 170 maysubstantially comprise silver, and may be applied to the cover portion152, handle 160 and/or platform 162 by plating or implant processes.

Referring to FIG. 4, illustrated is a perspective view of the inside ofthe cover portion 154 shown in FIG. 3. A substantial portion of theinterior surfaces 154 b of the cover portion 154 is coated with anabsorbing layer 170 partially or substantially comprising silver and/orother sulfide-absorbing compositions. FIG. 4 also depicts that the coverportion 154 may include various supports and/or mechanisms forpositioning and securing a reticle, possibly in conjunction withcorresponding supports and/or mechanisms of the base portion 152.

FIG. 5 is a magnified perspective view of a portion of the cover portion154 shown in FIG. 4. Referring to FIGS. 4 and 5, collectively, thecontainer apparatus 150 may contain one or more standoffs 164 which mayreduce or prevent erosion of the absorbing layer 170 in response tocontact with the reticle or other structure within the apparatus 150.For example, the standoffs 164 may partially or substantially compriseiron, rubber, plastic, and/or other materials selected to preventrubbing, wearing, chipping, scratching, or otherwise comprising theintegrity of the absorbing layer 170. The standoffs 164 may be coupledto the absorbing layer and/or other portion of the cover portion 154 byadhesive, bonding, welding, threaded or other mechanical fasteners,and/or other means. The coupling between the standoffs 164 may be adetachable coupling, such that the standoffs 164 may be replaced whennecessary. The standoffs 164 may also be coated with silver and/or othersulfide-absorbing compositions. Such coating may be applied to thestandoffs 164 before or after the standoffs 164 are secured to the coverportion 154.

Referring to FIG. 6, illustrated is a perspective view of the inside ofthe base portion 152 shown in FIG. 3. A substantial portion of theinterior surfaces 152 b of the base portion 152 is coated with anabsorbing layer 170 partially or substantially comprising silver and/orother sulfide-absorbing compositions. FIG. 6 also depicts that the baseportion 152 may include various supports and/or mechanisms forpositioning and securing a reticle, possibly in conjunction withcorresponding supports and/or mechanisms of the cover portion 154.

FIG. 7 is a magnified perspective view of a portion of the base portion152 shown in FIG. 6. Referring to FIGS. 6 and 7, collectively, thecontainer apparatus 150 may contain one or more standoffs 166 which mayreduce or prevent erosion of the absorbing layer 170 in response tocontact with the reticle or other structure within the apparatus 150.The standoffs 166 may be substantially similar to the standoffs 164, atleast with respect to composition, manufacture and assembly.

FIG. 8 is a top view of at least a portion of an embodiment of acontainer apparatus 200 according to aspects of the present disclosure,and FIG. 9 is a front view of the apparatus 200 shown in FIG. 8.Referring to FIGS. 8 and 9, collectively, the container 200 may be amask package for housing reticles with or without pellicles duringstorage and/or transportation. At least in this regard, the container200 may be substantially similar to the apparatus 100 and/or theapparatus 150 described above, such as with respect to composition,manufacture, and/or functionality.

For example, each of the containers 100, 150 and 200 may be configuredto house reticles with minimal contact to the reticles, including to theextent that the containers may be easily opened and closed for theaddition or removal of one or more reticles. The containers 100, 150 and200 may also be configured to minimize particle generation during theopening and closing of the containers 100, 150 and 200, as well asduring translation of reticles in and out of the containers 100, 150 and200. For example, and as described above, the containers 100, 150 and200 may comprise two structural halves or portions, such as the baseportions 102, 152 described above and the cover portions 104, 154described above. The container apparatus 200 also includes a baseportion 202 and a cover portion 204, which may be hinged together tofacilitate opening and closing the container 200 without separating thebase and covering portions 202, 204 (the base portions 102, 152 and thecover portions 104, 154 may be similarly hinged). For example, the baseportion 202 may be hinge-coupled to the cover portion 204 by a rollerhinge, which may minimize particle generation relative to other types ofhinges. However, other embodiments within the scope of the presentdisclosure may include hinges other than or in addition to roller hingesto couple the base portion 202 and the cover portion 204.

The container apparatus 200, as well as the apparatus 100 and 150described above and others within the scope of the present disclosure,may be configured to house a single reticle or multiple reticles. Ineither case, the housed reticles may include pellicles on one or bothsides. The reticles may include Ultratech reticles, Nikon reticles, GCAreticles, ASM reticles, and/or Canon reticles, among other commerciallyavailable examples, although future-developed or non-conventionalreticles may also be housed with the apparatus 200.

The apparatus 200 may also include latching means 270 configured to keepthe apparatus 200 closed after rotating the base portion 202 and coverportion 204 towards each other. The latching means 270 may comprise anycommercially available latches, hooks, fasteners, and/or other structurefor maintaining the closed configuration shown in FIG. 8. The latchingmeans 270 may also include robotic-compatible latching means.

An absorbing material may substantially cover the external surfaces 202a of the base portion 202 and the external surfaces 204 a of the coverportion 204. The absorbing material may be substantially similar to theabsorbing layer 120 described above, at least with respect tocomposition and manufacture. For example, the base and cover portions202, 204 may substantially comprise an aluminum, iron or steel structurethat is partially or substantially plated or otherwise coated withsilver, other sulfide-absorbing materials, and/or combinations or alloysthereof. The composition of such structure may also or alternativelycomprise other electrostatic dissipative materials. The structure of thebase and cover portions 202, 204 may, alternatively, substantiallycomprise silver, other sulfide-absorbing materials, and/or combinationsor alloys thereof, in contrast to merely being plated or otherwisecoated with a sulfide-absorbing composition.

The apparatus 200 may be configured to be generally compact and/orotherwise able to be stacked with other instances of the apparatus 200.For example, the base portion 202 may include a recess 202 c, and thecover portion 204 may include a protrusion 204 c configured to bereceived by the recess 202 c. The perimeters of the protrusion 204 c andthe recess 202 c may be configured such that, when multiple instances ofthe apparatus 200 are stacked in a vertical direction, the protrusion204 c and the recess 202 c cooperate to restrain or limit relativetranslation of the base and cover portions 202, 204 in a horizontaldirection.

For example, the perimeters of the protrusion 204 c and the recess 202 cmay substantially follow or conform to the outer perimeters of the baseand cover portions 202, 204, although being offset radially inward.However, such similarity between the shape or lateral profile of theprotrusion 204 c and recess 202 c relative to the perimeters of the baseand cover portions 202, 204 may not exist in some embodiments within thescope of the present disclosure, such that the protrusion 204 c and/orthe recess 202 c may have otherwise-shaped perimeters or lateralprofiles, including those with less or no similarity to the perimeter ofthe base or cover portions 202, 204. Moreover, the base portion 202 mayinclude a protrusion instead of the recess 202 c, such that the coverportion 204 includes a recess instead of the protrusion 204 c. Theheight/depth of the protrusion 204 c and/or the recess 202 c, may rangebetween about 1.0 mm and about 2.0 cm, such as about 5.0 mm. However,the depth of the recess 202 c may be at least slightly greater than theheight of the protrusion 204 c. Similarly, the lateral dimensions of therecess 202 c may be at least slightly greater than the lateraldimensions of the protrusion 204 c.

Referring to FIG. 10, illustrated is a top view of the apparatus 200shown in FIGS. 8 and 9. The apparatus 200 is depicted in FIG. 10 asbeing oriented in an open configuration, as opposed to the closedconfiguration depicted in FIGS. 8 and 9. The apparatus 200 may includeone or more landing pads 210 configured to prevent tearing or otherwisedamaging the reticles housed in the apparatus 200, and/or the pelliclesof such reticles. The landing pads 210 may be substantially to thestandoffs 164 described above, at least with respect to compositionand/or manufacture. However, the landing pads 210 may not have the sameshape as the standoffs 164, and may not have the same shapes as otherones of the landing pads 210. The landing pads 210 may be secured to theinside surfaces of the base and/or cover portions 202, 204 by adhesive,welding, threaded or other mechanical fasteners, and/or other means. Thelanding pads 210 may also be formed integral to the base and/or coverportions 202, 204, such as by a press-forming manufacturing process. Insuch embodiments, the raised surface of the landing pads 210 may becoated or treated with a material other than the silver or othersulfide-absorbing composition coating the remainder of the base andcover portions 202, 204, such as a material coating selected to minimizedamage resulting from physical contact with the reticle or pellicle.

The apparatus 200 also includes one or more guides 220 each configuredto minimize damage to the house reticle(s). For example, the guides 220may have rounded corners and edges, thereby minimizing the potential forscratching a reticle or tearing a pellicle when positioning a reticlebetween the guides 220. The guides 220 may also be sized and positionedwithin the base and/or cover portions 202, 204 such that the housedreticle(s) is secured in a central portion of the inner cavity of theapparatus 200. Consequently, the housed reticle(s) may be protectedagainst impact forces suffered by the exterior of the apparatus 200.

The apparatus 200 can also include one or more hinges 280 coupling thebase and cover portions 202, 204. The hinges 280 may be roller hinges,as described above, although other types of hinges are also within thescope of the present disclosure, such as butt hinges, continuous hinges,spring hinges, paumelle or olive knuckle hinges, and others. The hinges280 may also be configured such that the base and cover portions 202,204 are detachable when the latches 270 are released, such as may beaccomplished via loose joint hinges or other hinges having two separableparts.

In view of all of the above, it should be readily apparent to thoseskilled in the pertinent art that the present disclosure introduces areticle carrier including, at least in one embodiment, a base portionand a cover portion at least partially detachable from the base portion.The base portion and the cover portion are configured to collectivelyhouse a reticle in a region collectively defined by the base portion andthe cover portion when the base portion and the cover portion are fullyattached. At least a portion of an interior surface of at least one ofthe base portion and the cover portion is treated with asulfide-absorbing composition, such as silver or a silver-containingalloy.

Another embodiment of similar apparatus includes a reticle carrier and asulfide-absorbing member. The reticle carrier has an internal regionconfigured to house at least one reticle, wherein the reticle carrier atleast partially comprises an electrostatic dissipative composition. Thereticle carrier may be a commercially available product, in someembodiments. The sulfide-absorbing member is located at least partiallywithin the internal region of the reticle carrier.

According to aspects of these and other embodiments within the scope ofthe present disclosure, the various environments to which a reticle isexposed and which include sulfide can be less damaging when ammonia ispresent. That is, the sulfide-absorbing member or similarly treatedsurface of the reticle carrier may at least partially absorb the sulfidein such embodiments. Consequently, the conventional sulfide-ammoniareaction—that results in a haze forming on the reticle and/or otherproximate surfaces—may be reduced, and possibly eliminated to asubstantial degree. Moreover, this advantage can be obtained even whilethe structure of the reticle carrier partially or substantiallycomprises an electrostatic dissipative composition. Accordingly, theabove-described haze reduction can be achieved while maintainingadequate levels of ESD protection.

The present disclosure also introduces a method comprising, at least inone embodiment, positioning a reticle in a reticle carrier having aninterior space configured to receive and contain the reticle. The methodalso includes treating at least a portion of the reticle, an internalsurface of the interior space, or both, with a sulfide-absorbingcomposition. Aspects of this method and others within the scope of thepresent disclosure may be similarly advantageous relative to theapparatus aspects and advantages described above.

The foregoing outlines features of several embodiments so that thoseskilled in the art may better understand the aspects of the presentdisclosure. Those skilled in the art should appreciate that they mayreadily use the present disclosure as a basis for designing or modifyingother processes and structures for carrying out the same purposes and/orachieving the same advantages of the embodiments introduced herein.Those skilled in the art should also realize that such equivalentconstructions do not depart from the spirit and scope of the presentdisclosure, and that they may make various changes, substitutions andalterations herein without departing from the spirit and scope of thepresent disclosure.

1. A reticle carrier, comprising: a base portion; and a cover portion atleast partially detachable from the base portion, wherein: the baseportion and the cover portion are configured to collectively house areticle in a region collectively defined by the base portion and thecover portion when the base portion and the cover portion are fullyattached, and at least a portion of an interior surface of at least oneof the base portion and the cover portion is treated with asulfide-absorbing composition.
 2. The reticle carrier of claim 1 whereinthe sulfide-absorbing composition at least partially comprises silver.3. The reticle carrier of claim 1 wherein the at least a portion of aninterior surface of each of the base portion and the cover portion istreated with the sulfide-absorbing composition.
 4. The reticle carrierof claim 1 wherein the sulfide-absorbing composition is coated on thetreated portion of the interior surface.
 5. The reticle carrier of claim1 wherein the sulfide-absorbing composition is implanted into thetreated portion of the interior surface.
 6. The reticle carrier of claim1 wherein surfaces defining the region configured to house the reticleare substantially treated with the sulfide-absorbing composition.
 7. Thereticle carrier of claim 1 wherein at least a portion of an exteriorsurface of at least one of the base portion and the cover portion istreated with the sulfide-absorbing composition.
 8. The reticle carrierof claim 1 wherein a substantial portion of the exterior of the baseportion and the cover portion are substantially treated with thesulfide-absorbing composition.
 9. The reticle carrier of claim 1 whereinat least a portion of at least one of the base portion and the coverportion substantially comprises an electrostatic dissipativecomposition.
 10. A method, comprising: positioning a reticle in areticle carrier, the reticle carrier having an interior space configuredto receive and contain the reticle; and treating at least a portion ofone of the reticle and an internal surface of the interior space with asulfide-absorbing composition.
 11. The method of claim 10 wherein thesulfide-absorbing composition at least partially comprises silver. 12.The method of claim 10 wherein treating at least a portion of one of thereticle and the internal surface of the interior space includes coatingat least a portion of one of the reticle and the internal surface of theinterior space with the sulfide-absorbing composition.
 13. The method ofclaim 10 wherein treating at least a portion of one of the reticle andthe internal surface of the interior space includes implanting at leasta portion of one of the reticle and the internal surface of the interiorspace with the sulfide-absorbing composition.
 14. The method of claim 10wherein treating at least a portion of one of the reticle and theinternal surface of the interior space includes treating a substantialportion of a surface of the reticle with the sulfide-absorbingcomposition.
 15. The method of claim 10 wherein treating at least aportion of one of the reticle and the internal surface of the interiorspace includes treating a substantial portion of a surface of a pelliclecoupled to the reticle with the sulfide-absorbing composition.
 16. Themethod of claim 10 wherein treating at least a portion of one of thereticle and the internal surface of the interior space includes treatinga substantial portion of the internal surface of the interior space withthe sulfide-absorbing composition.
 17. An apparatus, comprising: areticle carrier having an internal region configured to house at leastone reticle, wherein the reticle carrier at least partially comprises anelectrostatic dissipative composition; and a sulfide-absorbing memberlocated at least partially within the internal region of the reticlecarrier.
 18. The apparatus of claim 17 wherein the sulfide-absorbingmember is a metallic member having the electrostatic dissipativecomposition, is integral to the reticle carrier, and at least partiallydefines the internal region of the reticle carrier.
 19. The apparatus ofclaim 17 wherein the sulfide-absorbing member comprises anon-sulfide-absorbing structure, wherein at least a portion of a surfaceof the non-sulfide-absorbing structure is coated with asulfide-absorbing composition.
 20. The apparatus of claim 17 wherein thesulfide-absorbing member comprises a non-sulfide-absorbing structure,wherein at least a portion of a surface of the non-sulfide-absorbingstructure is implanted with a sulfide-absorbing composition.